Abstract und Zusammenfassung zu
"Development of an optical triangulation based autofocus system for an EUV defect inspection tool"
(Entwicklung eines Autofocussystems zur EUV Defektuntersuchung mit optischer Triagulation)

Vorlesung


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Zusammenfassung

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Abstract

"Imaging with nanometer resolution involves a depth of focus (DOF) in the same scale. For efficient microscopy the focusing of the objective to the sample has to be automated to enable a high sample throughput. A technical realization of autofocusing is optical triangulation. Hereby a shift of the sample results in a shift of the reflected beam at the sample, which corresponds to a shift of the beam at the detector plane. Sub 100nm-shifts of the sample will cause only slight shifts in the image plane, whereby noise becomes a limiting factor in the sensitivity of the triangulation system. Noise reduction by optimization of the beam path and suited image processing algorithms increases the sensitivity of the system. The following steps were performed: 1. Design of an autofocus setup, which is suited to the EUV microscope 2. Assembling and commissioning of the setup 3. Software development of the autofocusing algorithm 4. Demonstration of autofocus operatin"

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